@article{McGettrick:2017:10.1016/j.orgel.2017.06.022,
author = {McGettrick, JD and Speller, E and Li, Z and Tsoi, WC and Durrant, JR and Watson, T},
doi = {10.1016/j.orgel.2017.06.022},
journal = {ORGANIC ELECTRONICS},
pages = {85--93},
title = {Use of gas cluster ion source depth profiling to study the oxidation of fullerene thin films by XPS},
url = {http://dx.doi.org/10.1016/j.orgel.2017.06.022},
volume = {49},
year = {2017}
}

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TY  - JOUR
AU  - McGettrick,JD
AU  - Speller,E
AU  - Li,Z
AU  - Tsoi,WC
AU  - Durrant,JR
AU  - Watson,T
DO  - 10.1016/j.orgel.2017.06.022
EP  - 93
PY  - 2017///
SN  - 1566-1199
SP  - 85
TI  - Use of gas cluster ion source depth profiling to study the oxidation of fullerene thin films by XPS
T2  - ORGANIC ELECTRONICS
UR  - http://dx.doi.org/10.1016/j.orgel.2017.06.022
UR  - http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000409570500012&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=1ba7043ffcc86c417c072aa74d649202
VL  - 49
ER  - 

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